Vapor Loss Characterization #10 - Vapor wall loss RH parameterization for HMHP, HCOOH, H2O2
Name:
Vapor wall loss RH parameterization for HMHP, HCOOH, H2O2
Instrument:
Chemical Ionization Mass Spectrometer with CF3O-
Chamber:
Near/Far Bag 2012-2015 (Tran)
Temperature (°C):
24
Relative humidity (%):
90
Volatile compound name or class:
HMHP, H2O2, HCOOH
Volatile compound source:
- In-situ formation via reaction
Date of characterization experiment:
2016-05-11
Months since calibration:
Wall loss experiment description:
HMHP, HCOOH, and H2O2 were made in the chamber at different RH and the loss observed. Then the trend with respect to RH was reported
Vapor loss calculation method:
Fitted the amount of chemical remaining with time for the loss rate in per minute
Parameterization developed:
Yes
Parameterization description:
The parameterization is a linear trend with relative humidity, after the individual loss rates were obtained, then the RH dependence was fitted using the linear least squares method
Link to supplemental information:
Additional notes:
Characterization data file:
Vapor_Wall_Loss_20160511_HCOOH_HMHP_H2O2.csv