Name:
HMHP, H2O2, HCOOH wall loss RH dependent

Instrument:
Parameterization of vapor wall loss

Chamber:
Seinfeld chambers

Temperature (°C):
22

Relative humidity (%):
0

Volatile compound name or class:
HMHP, HCOOH, H2O2

Volatile compound source:

• Direct injection of commercial standards
• Direct injection of synthesized standards

Date of characterization experiment:
2015-05-11

Months since calibration:

Wall loss experiment description:
Chemicals were introduced into the chamber at different relative humidity and the first-order decay rates were reported against RH

Vapor loss calculation method:
First-order exponential fits in Origin Software

Parameterization developed:
Yes

Parameterization description:

Link to supplemental information:

Additional notes:

Characterization data file:
Vapor_Wall_Loss_20160511_HCOOH_HMHP_H2O2.csv